F. Rodriguez Books
Polymers In Electronics
By J. Downing, F. Rodriguez, Hiroshi Itō, R D Miller, C C. Walker, Theodore Davidson, Ching-Ping Wong, J. Brettle, C. C. Anderson, B. Bednář, J. V. Crivello, Saburo Nonogaki, E. Wallace, C. Grant Willson, J. Kralicek, J. Duran, C. R. Morgan, M.T. Goosey, Katsumi Tanigaki, Hiroshi Shiraishi, M J Bowden, J. Michl, S. K. Obendorf, Juey H. Lai, A. C. OUANO, D. L. ALLARA, D. R. MCKEAN, T. L. TOMPKINS, N. CLECAK, W. T. BABIE, M-F. CHOW, W. M. MOREAU, H. HIRAOKA, L. W. WELSH, J. N. HELBERT, M. A. SCHMIDT, C. MALKIEWICZ, C. U. PITTMAN, TOSHIAKI TAMAMURA, SABURO IMAMURA, SHUNGO SUGAWARA, P. D. KRASICKY, Y. NAMASTE, J. DEVÁTÝ, J. ZACHOVAL, W. I. VROOM, J. FRACKOVIAK, L. C. KELLEY, D. R. FALCONE, T. N. BOWMER, ASAO ISOBE, FUMIO MURAI, YOSHITAKE OHNISHI, SHOZO FUJIWARA, AKIHIRO FURUTA, P. METZGER COTTS, W. VOLKSEN, N. S. VISWANATHAN, GARY C. DAVIS, WINSTON C. MIH, K. B. WISCHMANN, F. W. AINGER, I. DIX, R. D. SMALL, J. A. ORS, B. S. H. ROYCE, J. B. ENNS, NEIL S. FOX, D. R. KYLE, R. W. BUSH, Z. N. SANJANA, R. S. RAGHAVA, J. R. MARCHETTI, P. PANTELIS, LESLEY J. GOLDSTEI
ix, 605 pages : 24 cm Includes bibliographical references and index Applications of photoinitiated cationic polymerization to the development of new photoresists / J.V. Crivello -- Applications of...
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Polymers For Microelectronics: Resists And Dielectrics
By Thompson, C. W. Frank, F. Rodriguez, Ê Chin, A. Kira, David R. Bassett, Ying Jiang, R. F. W. Pease, Nobuo Matsumura, J. M. Calvert, Ralph Dammel, L. F Thompson, James R. Sheats, C. D Snyder, Y. Ueda, S. Tagawa, K Watanabe, Y. Yoshida, Makoto Murata, Seiichi Tagawa, H. Ito, C. Grant Willson, T. Kusumoto, R. D. Allen, V. Rao, Tohru Matsuura, Kiichi Takemoto, H. R. Allcock, Larry F. Thompson, L. L. Simpson, T. Long, Yoshiaki Inaki, V. T. Stannett, J. M. Kometani, R. R. Kunz, Larry F. Et Al (Eds), E. Reichmanis, F. M. Houlihan, O. Nalamasu, T. X. Neenan, N. Takeyama, H. Ueki, M. Hanabata, Y. Maekawa, R. Sooriyakumaran, E. A. Mash, Eiichi Kobayashi, Mikio Yamachika, Yasutaka Kobayashi, Yoshiji Yumoto, Takao Miura, W. D. Hinsberg, S. A. MacDonald, C.-P. Lei, S. K. Obendorf, Kwang-Duk Ahn, Deok-Il Koo, G. M. Wallraff, Masamitsu Shirai, Masahiro Tsunooka, E. Yano, T. Namiki, Y. Yoneda, W. J. Dressick, C. S. Dulcey, M. S. Chen, J. H. Georger, D. A. Stenger, T. S. Koloski, G. S. Calabrese, Michael T. Pottiger, John C. Coburn, M. F. Welker, G. L. Grune, R. T. Chern, Shinji Ando, Shigekuni Sasaki, K. Ushida, H. Sh
Presents recent advances in chemically amplified resists for deep UV, electron beam, and X-ray advanced lithographic technologies. Discusses top surface imaging and dry development resists. Examin...
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Privatization And Labor: Responses And Consequences In Global Perspective
By B. Martin, F. Rodriguez, M. Rama, E. Vinogradova, C. Alexander, M. Rein, P. Keat, C. B. Frances, Marsha Pripstein Posusney, C. Candland
Introduction / Linda J. Cook And Craig Murphy -- Unions In Transition: Why Organized Labor Embraced Economic Reform In Poland (1989-99) / Preston Keat -- Egyptian Labor Struggles In The Era Of Priv...
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