Handbook Of Photomask Manufacturing Technology

By Wilhelm Maurer, Syed A. Rizvi, Yoshio Nishi, Vladimir Liberman, Ray J. Hoobler, Franklin Schellenberg, Randall Lee, Syed Rizvi, Axel Zibold, Nobuyuki Yoshioka, C. Grant Willson, Michael T. Postek, Andreas Erdmann, Yung-Tsai Yen, Kurt R. Kimmel, R. Lal Tummala, David R. Medeiros, Min Bai, Sergey Babin, Christian Kalus, Hal Kusunose, S. Muckenhirn, James Potzick, Masatoshi Oda, Christer Rydberg, Anja Rosenbusch, Norio Saitou, Pei-Yang Yan, Andrew G. Zanzal, Takayoshi Matsuyama, Ebru Apak, Makato Yonezawa, Michael Lercel, R. Fabian Pease, Dachen Chu, Benjamen M. Rathsack, P.J.M. Van Adrichem, Joerg Butschke, Shirley Hemar, Frank-Michael Kamm, Florian Letzkus, Hans Loeschner, A. Meyyappan, Michael T. Takac, Shane R. Palmer

As the semiconductor industry attempts to increase the number of functions that will fit into the smallest space on a chip, it becomes increasingly important for new technologies to keep apace with...

Polymers In Electronics

By J. Downing, F. Rodriguez, Hiroshi Itō, R D Miller, C C. Walker, Theodore Davidson, Ching-Ping Wong, J. Brettle, C. C. Anderson, B. Bednář, J. V. Crivello, Saburo Nonogaki, E. Wallace, C. Grant Willson, J. Kralicek, J. Duran, C. R. Morgan, M.T. Goosey, Katsumi Tanigaki, Hiroshi Shiraishi, M J Bowden, J. Michl, S. K. Obendorf, Juey H. Lai, A. C. OUANO, D. L. ALLARA, D. R. MCKEAN, T. L. TOMPKINS, N. CLECAK, W. T. BABIE, M-F. CHOW, W. M. MOREAU, H. HIRAOKA, L. W. WELSH, J. N. HELBERT, M. A. SCHMIDT, C. MALKIEWICZ, C. U. PITTMAN, TOSHIAKI TAMAMURA, SABURO IMAMURA, SHUNGO SUGAWARA, P. D. KRASICKY, Y. NAMASTE, J. DEVÁTÝ, J. ZACHOVAL, W. I. VROOM, J. FRACKOVIAK, L. C. KELLEY, D. R. FALCONE, T. N. BOWMER, ASAO ISOBE, FUMIO MURAI, YOSHITAKE OHNISHI, SHOZO FUJIWARA, AKIHIRO FURUTA, P. METZGER COTTS, W. VOLKSEN, N. S. VISWANATHAN, GARY C. DAVIS, WINSTON C. MIH, K. B. WISCHMANN, F. W. AINGER, I. DIX, R. D. SMALL, J. A. ORS, B. S. H. ROYCE, J. B. ENNS, NEIL S. FOX, D. R. KYLE, R. W. BUSH, Z. N. SANJANA, R. S. RAGHAVA, J. R. MARCHETTI, P. PANTELIS, LESLEY J. GOLDSTEI

ix, 605 pages : 24 cm Includes bibliographical references and index Applications of photoinitiated cationic polymerization to the development of new photoresists / J.V. Crivello -- Applications of...

Polymers For Microelectronics: Resists And Dielectrics

By Thompson, C. W. Frank, F. Rodriguez, Ê Chin, A. Kira, David R. Bassett, Ying Jiang, R. F. W. Pease, Nobuo Matsumura, J. M. Calvert, Ralph Dammel, L. F Thompson, James R. Sheats, C. D Snyder, Y. Ueda, S. Tagawa, K Watanabe, Y. Yoshida, Makoto Murata, Seiichi Tagawa, H. Ito, C. Grant Willson, T. Kusumoto, R. D. Allen, V. Rao, Tohru Matsuura, Kiichi Takemoto, H. R. Allcock, Larry F. Thompson, L. L. Simpson, T. Long, Yoshiaki Inaki, V. T. Stannett, J. M. Kometani, R. R. Kunz, Larry F. Et Al (Eds), E. Reichmanis, F. M. Houlihan, O. Nalamasu, T. X. Neenan, N. Takeyama, H. Ueki, M. Hanabata, Y. Maekawa, R. Sooriyakumaran, E. A. Mash, Eiichi Kobayashi, Mikio Yamachika, Yasutaka Kobayashi, Yoshiji Yumoto, Takao Miura, W. D. Hinsberg, S. A. MacDonald, C.-P. Lei, S. K. Obendorf, Kwang-Duk Ahn, Deok-Il Koo, G. M. Wallraff, Masamitsu Shirai, Masahiro Tsunooka, E. Yano, T. Namiki, Y. Yoneda, W. J. Dressick, C. S. Dulcey, M. S. Chen, J. H. Georger, D. A. Stenger, T. S. Koloski, G. S. Calabrese, Michael T. Pottiger, John C. Coburn, M. F. Welker, G. L. Grune, R. T. Chern, Shinji Ando, Shigekuni Sasaki, K. Ushida, H. Sh

Presents recent advances in chemically amplified resists for deep UV, electron beam, and X-ray advanced lithographic technologies. Discusses top surface imaging and dry development resists. Examin...

Electronic And Photonic Applications Of Polymers: Developed From A Symposium Sponsored By The Division Of Polymeric Materials Science And Engineer

By Hiroshi Itō, David Williams, Gregory L Baker, G. G. Roberts, Murrae J. Bowden, Saburo Nonogaki, James M. Pearson, C. Grant Willson, S. Richard Turner, Murrae Bowden, M J Bowden, Takao Iwayanagi, Takumi Ueno

Annotation. Papers of a symposium at the 192nd Meeting of the ACS Anaheim, Calif. Sept. 1988. Polymers have become a part of our everyday life. In the telecommunications industry applications have...

Advances In Resist Technology

By C. G. Willson, C. Grant Willson, C. Grant Wilson

Advances In Resist Technology And Processing III (Spie Volume 631)

By C. G. Willson, C. Grant Willson

Handbook Of Photomask Manufacturing Technology

By Wilhelm Maurer, Yoshio Nishi, Vladimir Liberman, Ray J. Hoobler, Franklin Schellenberg, Randall Lee, Syed Rizvi, Axel Zibold, Nobuyuki Yoshioka, C. Grant Willson, Michael T. Postek, Andreas Erdmann, Yung-Tsai Yen, Kurt R. Kimmel, R. Lal Tummala, David R. Medeiros, Min Bai, Sergey Babin, Christian Kalus, Hal Kusunose, S. Muckenhirn, James Potzick, Masatoshi Oda, Christer Rydberg, Anja Rosenbusch, Norio Saitou, Pei-Yang Yan, Andrew G. Zanzal, Takayoshi Matsuyama, Ebru Apak, Makato Yonezawa, Michael Lercel, R. Fabian Pease, Dachen Chu, Benjamen M. Rathsack, P.J.M. Van Adrichem, Joerg Butschke, Shirley Hemar, Frank-Michael Kamm, Florian Letzkus, Hans Loeschner, A. Meyyappan, Michael T. Takac, Shane R. Palmer

As the semiconductor industry attempts to increase the number of functions that will fit into the smallest space on a chip, it becomes increasingly important for new technologies to keep apace with...

Handbook Of Photomask Manufacturing Technology

By Wilhelm Maurer, Yoshio Nishi, Vladimir Liberman, Ray J. Hoobler, Franklin Schellenberg, Randall Lee, Syed Rizvi, Axel Zibold, Nobuyuki Yoshioka, C. Grant Willson, Michael T. Postek, Andreas Erdmann, Yung-Tsai Yen, Kurt R. Kimmel, R. Lal Tummala, David R. Medeiros, Min Bai, Sergey Babin, Christian Kalus, Hal Kusunose, S. Muckenhirn, James Potzick, Masatoshi Oda, Christer Rydberg, Anja Rosenbusch, Norio Saitou, Pei-Yang Yan, Andrew G. Zanzal, Takayoshi Matsuyama, Ebru Apak, Makato Yonezawa, Michael Lercel, R. Fabian Pease, Dachen Chu, Benjamen M. Rathsack, P.J.M. Van Adrichem, Joerg Butschke, Shirley Hemar, Frank-Michael Kamm, Florian Letzkus, Hans Loeschner, A. Meyyappan, Michael T. Takac, Shane R. Palmer

As the semiconductor industry attempts to increase the number of functions that will fit into the smallest space on a chip, it becomes increasingly important for new technologies to keep apace with...

Handbook Of Photomask Manufacturing Technology

By Wilhelm Maurer, Yoshio Nishi, Vladimir Liberman, Ray J. Hoobler, Franklin Schellenberg, Randall Lee, Syed Rizvi, Axel Zibold, Nobuyuki Yoshioka, C. Grant Willson, Avery N. Goldstein, Michael T. Postek, Andreas Erdmann, Yung-Tsai Yen, Kurt R. Kimmel, R. Lal Tummala, David R. Medeiros, Min Bai, Sergey Babin, Christian Kalus, Hal Kusunose, S. Muckenhirn, James Potzick, Masatoshi Oda, Christer Rydberg, Anja Rosenbusch, Norio Saitou, Pei-Yang Yan, Andrew G. Zanzal, Takayoshi Matsuyama, Ebru Apak, Makato Yonezawa, Michael Lercel, R. Fabian Pease, Dachen Chu, Benjamen M. Rathsack, P.J.M. Van Adrichem, Joerg Butschke, Shirley Hemar, Frank-Michael Kamm, Florian Letzkus, Hans Loeschner, A. Meyyappan, Michael T. Takac, Shane R. Palmer

As the semiconductor industry attempts to increase the number of functions that will fit into the smallest space on a chip, it becomes increasingly important for new technologies to keep apace with...

Polymers In Electronics : Based On A Symposium Sponsored By The Division Of Organic Coatings And Plastics Chemistry At The 185th Meeting Of The American Chemical Society, Seattle, Washington, March 20-25, 1983

By J. Downing, F. Rodriguez, Hiroshi Itō, R D Miller, C C. Walker, Theodore Davidson, Ching-Ping Wong, J. Brettle, C. C. Anderson, B. Bednář, J. V. Crivello, Saburo Nonogaki, E. Wallace, C. Grant Willson, J. Kralicek, J. Duran, C. R. Morgan, M.T. Goosey, Katsumi Tanigaki, Hiroshi Shiraishi, M J Bowden, J. Michl, S. K. Obendorf, Juey H. Lai, A. C. OUANO, D. L. ALLARA, D. R. MCKEAN, T. L. TOMPKINS, N. CLECAK, W. T. BABIE, M-F. CHOW, W. M. MOREAU, H. HIRAOKA, L. W. WELSH, J. N. HELBERT, M. A. SCHMIDT, C. MALKIEWICZ, C. U. PITTMAN, TOSHIAKI TAMAMURA, SABURO IMAMURA, SHUNGO SUGAWARA, P. D. KRASICKY, Y. NAMASTE, J. DEVÁTÝ, J. ZACHOVAL, W. I. VROOM, J. FRACKOVIAK, L. C. KELLEY, D. R. FALCONE, T. N. BOWMER, ASAO ISOBE, FUMIO MURAI, YOSHITAKE OHNISHI, SHOZO FUJIWARA, AKIHIRO FURUTA, P. METZGER COTTS, W. VOLKSEN, N. S. VISWANATHAN, GARY C. DAVIS, WINSTON C. MIH, K. B. WISCHMANN, F. W. AINGER, I. DIX, R. D. SMALL, J. A. ORS, B. S. H. ROYCE, J. B. ENNS, NEIL S. FOX, D. R. KYLE, R. W. BUSH, Z. N. SANJANA, R. S. RAGHAVA, J. R. MARCHETTI, P. PANTELIS, LESLEY J. GOLDSTEI

ix, 605 pages : 24 cm Includes bibliographical references and index Applications of photoinitiated cationic polymerization to the development of new photoresists / J.V. Crivello -- Applications of...