Chemically Modified Surfaces In Catalysis And Electrocatalysis

By Alan Brenner, B. P. Sullivan, Bernard BESSON, Robert H. Lane, B.C. Gates, Joel S. Miller, M. Salmon, J. M. Calvert, William R. Peterson, A. Diaz, Paul Bussiere, Jean-Marie Basset, Brian P. Sullivan, T. J. Thomas, David E. Bergbreiter, Barry Arkles, C.E. Rice, T. J Pinnavaia, Michel Leconte, Hector D. Abruna, Charles D. Ellis, T. J. Meyer, P. Jayalekshmy, Theodore Kuwana, Yves Chauvin, William R. Murphy, Jean-Alain Dalmon, Kevin King, Mark S. Wrighton, Thomas J. Meyer, American Chemical Society Division Of Inorganic Chemistry; American Chemical Society Division Of Analytical Chemistry; American Chemical Society Division Of Petroleum Chemistry, J. V. MINKIEWICZ, D. MILSTEIN, J. LIETO, R. L. ALBRIGHT, MARIAN S. BURSTEN, KAELYN COOK, GREGORY L. PARSONS, S. MAZUR, J. T. ANDERSSON, T. MATUSINOVIC, J. GOITIA, DENNIS M. DIMARCO, PAUL A. FORSHEY, JEFFREY M. CALVERT, PETER DENISEVICH, ROYCE R. MURRAY, JERRY L. WALSH, HARRY O. FINKLEA, R. VITHANAGE, C. A. LUNDGREN, N. R. ARMSTRONG, T. MEZZA, C. L. LINKOUS, B. THACKER, T. KLOFTA, R. CIESLINSKI, MARTIN B. DINES, PETER M. DIGIACOMO, KENNETH P. CALLAHAN, PETER C. GRIFFITH, RICCI E. COOKSEY, FRANÇOIS HUGUES, DOMINIQUE COMMEREUC, DENNIS A. HUCUL

Chemically Modified Surfaces In Catalysis / David E. Bergbreiter -- Preparation And Characterization Of Poly(styrene-divinylbenzene)-supported Catalysts / J.v. Minkiewicz, D. Milstein, J. Lieto, B....

Polymers For Microelectronics: Resists And Dielectrics

By Thompson, C. W. Frank, F. Rodriguez, Ê Chin, A. Kira, David R. Bassett, Ying Jiang, R. F. W. Pease, Nobuo Matsumura, J. M. Calvert, Ralph Dammel, L. F Thompson, James R. Sheats, C. D Snyder, Y. Ueda, S. Tagawa, K Watanabe, Y. Yoshida, Makoto Murata, Seiichi Tagawa, H. Ito, C. Grant Willson, T. Kusumoto, R. D. Allen, V. Rao, Tohru Matsuura, Kiichi Takemoto, H. R. Allcock, Larry F. Thompson, L. L. Simpson, T. Long, Yoshiaki Inaki, V. T. Stannett, J. M. Kometani, R. R. Kunz, Larry F. Et Al (Eds), E. Reichmanis, F. M. Houlihan, O. Nalamasu, T. X. Neenan, N. Takeyama, H. Ueki, M. Hanabata, Y. Maekawa, R. Sooriyakumaran, E. A. Mash, Eiichi Kobayashi, Mikio Yamachika, Yasutaka Kobayashi, Yoshiji Yumoto, Takao Miura, W. D. Hinsberg, S. A. MacDonald, C.-P. Lei, S. K. Obendorf, Kwang-Duk Ahn, Deok-Il Koo, G. M. Wallraff, Masamitsu Shirai, Masahiro Tsunooka, E. Yano, T. Namiki, Y. Yoneda, W. J. Dressick, C. S. Dulcey, M. S. Chen, J. H. Georger, D. A. Stenger, T. S. Koloski, G. S. Calabrese, Michael T. Pottiger, John C. Coburn, M. F. Welker, G. L. Grune, R. T. Chern, Shinji Ando, Shigekuni Sasaki, K. Ushida, H. Sh

Presents recent advances in chemically amplified resists for deep UV, electron beam, and X-ray advanced lithographic technologies. Discusses top surface imaging and dry development resists. Examin...

Chemically Modified Surfaces In Catalysis And Electrocatalysis : Based On A Symposium Jointly Sponsored By The Divisions Of Inorganic, Analytical And Petroleum Chemistry At The 182nd ACS National Meeting, New York, New York, August 23-25, 1981

By Alan Brenner, B. P. Sullivan, Bernard BESSON, Robert H. Lane, B.C. Gates, Joel S. Miller, M. Salmon, J. M. Calvert, William R. Peterson, A. Diaz, Paul Bussiere, Jean-Marie Basset, Brian P. Sullivan, T. J. Thomas, David E. Bergbreiter, Barry Arkles, C.E. Rice, T. J Pinnavaia, Michel Leconte, Hector D. Abruna, Charles D. Ellis, T. J. Meyer, P. Jayalekshmy, Theodore Kuwana, Yves Chauvin, William R. Murphy, Jean-Alain Dalmon, Kevin King, Mark S. Wrighton, Thomas J. Meyer, J. V. MINKIEWICZ, D. MILSTEIN, J. LIETO, R. L. ALBRIGHT, MARIAN S. BURSTEN, KAELYN COOK, GREGORY L. PARSONS, S. MAZUR, J. T. ANDERSSON, T. MATUSINOVIC, J. GOITIA, DENNIS M. DIMARCO, PAUL A. FORSHEY, JEFFREY M. CALVERT, PETER DENISEVICH, ROYCE R. MURRAY, JERRY L. WALSH, HARRY O. FINKLEA, R. VITHANAGE, C. A. LUNDGREN, N. R. ARMSTRONG, T. MEZZA, C. L. LINKOUS, B. THACKER, T. KLOFTA, R. CIESLINSKI, MARTIN B. DINES, PETER M. DIGIACOMO, KENNETH P. CALLAHAN, PETER C. GRIFFITH, RICCI E. COOKSEY, FRANÇOIS HUGUES, DOMINIQUE COMMEREUC, DENNIS A. HUCUL

Chemically Modified Surfaces In Catalysis / David E. Bergbreiter -- Preparation And Characterization Of Poly(styrene-divinylbenzene)-supported Catalysts / J.v. Minkiewicz, D. Milstein, J. Lieto, B....

Polymers For Microelectronics : Resists And Dielectrics : Developed From A Symposium Sponsored By The Division Of Polymeric Materials: Science And Engineering, Inc., Of The American Chemical Society And The Society Of Polymer Science, Japan, At The 203rd National Meeting Of The American Chemical Society, San Francisco, California, April 5-10, 1992

By C. W. Frank, F. Rodriguez, Ê Chin, A. Kira, David R. Bassett, Ying Jiang, R. F. W. Pease, Nobuo Matsumura, J. M. Calvert, Ralph Dammel, L. F Thompson, James R. Sheats, C. D Snyder, Y. Ueda, S. Tagawa, K Watanabe, Y. Yoshida, Makoto Murata, Seiichi Tagawa, H. Ito, C. Grant Willson, T. Kusumoto, R. D. Allen, V. Rao, Tohru Matsuura, Kiichi Takemoto, H. R. Allcock, Larry F. Thompson, L. L. Simpson, T. Long, Yoshiaki Inaki, V. T. Stannett, J. M. Kometani, R. R. Kunz, E. Reichmanis, F. M. Houlihan, O. Nalamasu, T. X. Neenan, N. Takeyama, H. Ueki, M. Hanabata, Y. Maekawa, R. Sooriyakumaran, E. A. Mash, Eiichi Kobayashi, Mikio Yamachika, Yasutaka Kobayashi, Yoshiji Yumoto, Takao Miura, W. D. Hinsberg, S. A. MacDonald, C.-P. Lei, S. K. Obendorf, Kwang-Duk Ahn, Deok-Il Koo, G. M. Wallraff, Masamitsu Shirai, Masahiro Tsunooka, E. Yano, T. Namiki, Y. Yoneda, W. J. Dressick, C. S. Dulcey, M. S. Chen, J. H. Georger, D. A. Stenger, T. S. Koloski, G. S. Calabrese, Michael T. Pottiger, John C. Coburn, M. F. Welker, G. L. Grune, R. T. Chern, Shinji Ando, Shigekuni Sasaki, K. Ushida, H. Sh

Presents recent advances in chemically amplified resists for deep UV, electron beam, and X-ray advanced lithographic technologies. Discusses top surface imaging and dry development resists. Examin...

Electrónica

By J. M. Calvert