E. Reichmanis Books

Polymers For Microelectronics: Resists And Dielectrics

By Thompson, C. W. Frank, F. Rodriguez, Ê Chin, A. Kira, David R. Bassett, Ying Jiang, R. F. W. Pease, Nobuo Matsumura, J. M. Calvert, Ralph Dammel, L. F Thompson, James R. Sheats, C. D Snyder, Y. Ueda, S. Tagawa, K Watanabe, Y. Yoshida, Makoto Murata, Seiichi Tagawa, H. Ito, C. Grant Willson, T. Kusumoto, R. D. Allen, V. Rao, Tohru Matsuura, Kiichi Takemoto, H. R. Allcock, Larry F. Thompson, L. L. Simpson, T. Long, Yoshiaki Inaki, V. T. Stannett, J. M. Kometani, R. R. Kunz, Larry F. Et Al (Eds), E. Reichmanis, F. M. Houlihan, O. Nalamasu, T. X. Neenan, N. Takeyama, H. Ueki, M. Hanabata, Y. Maekawa, R. Sooriyakumaran, E. A. Mash, Eiichi Kobayashi, Mikio Yamachika, Yasutaka Kobayashi, Yoshiji Yumoto, Takao Miura, W. D. Hinsberg, S. A. MacDonald, C.-P. Lei, S. K. Obendorf, Kwang-Duk Ahn, Deok-Il Koo, G. M. Wallraff, Masamitsu Shirai, Masahiro Tsunooka, E. Yano, T. Namiki, Y. Yoneda, W. J. Dressick, C. S. Dulcey, M. S. Chen, J. H. Georger, D. A. Stenger, T. S. Koloski, G. S. Calabrese, Michael T. Pottiger, John C. Coburn, M. F. Welker, G. L. Grune, R. T. Chern, Shinji Ando, Shigekuni Sasaki, K. Ushida, H. Sh

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Presents recent advances in chemically amplified resists for deep UV, electron beam, and X-ray advanced lithographic technologies. Discusses top surface imaging and dry development resists. Examin...

Polymeric Materials For Microelectronic Applications: Science And Technology

By Hiroshi Itō, David Creed, T SUGIMURA, Jirō Nakamura, Kazuyuki Horie, Satoshi Saitō, Y. Aoki, Yōichi Yoshida, S. Perutz, S. Nagai, M. Hasegawa, K. Yoshida, Lixin Jin, Hiroshi Ban, Mitsuru Ueda, H. Shibata, Seiichi Tagawa, Anselm C Griffin, Y. Okamoto, Takeo Watanabe, P. Mirau, H. Franke, Yoshio Yamashita, R. Reuter, Nigel P. Hacker, E. Reichmanis, Masamitsu Shirai, Masahiro Tsunooka, Shinji Ando, Richard A. Cozad, Charles E. Hoyle, Petharnan Subramanian, Sangya S. Varma, Krishnan Venkataram, Paul H. Kasai, H. Namba, F. Hosoi, M. E. Galvin, K. E. Uhrich, S. A. Heffner, Yasunari Maekawa, Takahiro Kozawa, M. Uesaka, Katsumi Maeda, Kaichiro Nakano, Etsuo Hasegawa, I. Naito, A. Kinoshita, S. Takamuku, Yoshio Kawai, Akinobu Tanaka, Koji Asakawa, Akinori Hongu, Naohiko Oyasato, Makoto Nakase, Tohru Ushirogouchi, Hiromitsu Wakabayashi, Tomonobu Sumino, Ki-Ho Baik, Luc Van Den Hove, Masashi Kaji, T. Matano, Y. Shindo, Amane Mochizuki, Tadashi Teranishi, Toshihiko Omote, T. Yamaoka, S. Yokoyama, T. Omote, K. Naitoh, C. Feger, J. E. McGrath, M. Osterfeld, Takashi Saw

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ix, 468 pages : 24 cm Includes bibliographical references and indexes Photophysics, photochemistry, and photo-optical effects in polymer solids / Kazuyuki Horie -- Photochemistry of liquid-crystall...

How to Convert ISBN-10 to ISBN-13 (and Vice Versa): A Complete Guide

If you’re in the world of books—whether as a publisher, librarian, bookseller, or avid collector—you’ve likely come across the terms ISBN-10 and ISBN-13. Understanding these formats and knowing how to convert between them is essential for maintaining consistency and compatibility in book records. In this post, we’ll cover everything you need to know about ISBN conversions, step by step.

What is an EAN and How Does it Relate to an ISBN?

If you’ve ever purchased a product online or in a store, you’ve likely come across a barcode. Behind these barcodes lies a standardized system that makes modern commerce possible. Two key codes often encountered are the EAN (European Article Number) and ISBN (International Standard Book Number). But what are they, how are they connected, and why are they so crucial? Let’s explore.