D. A. Stenger Books

Polymers For Microelectronics: Resists And Dielectrics
Polymers For Microelectronics: Resists And Dielectrics

By Thompson, C. W. Frank, F. Rodriguez, Ê Chin, A. Kira, David R. Bassett, Ying Jiang, R. F. W. Pease, Nobuo Matsumura, J. M. Calvert, Ralph Dammel, L. F Thompson, James R. Sheats, C. D Snyder, Y. Ueda, S. Tagawa, K Watanabe, Y. Yoshida, Makoto Murata, Seiichi Tagawa, H. Ito, C. Grant Willson, T. Kusumoto, R. D. Allen, V. Rao, Tohru Matsuura, Kiichi Takemoto, H. R. Allcock, Larry F. Thompson, L. L. Simpson, T. Long, Yoshiaki Inaki, V. T. Stannett, J. M. Kometani, R. R. Kunz, Larry F. Et Al (Eds), E. Reichmanis, F. M. Houlihan, O. Nalamasu, T. X. Neenan, N. Takeyama, H. Ueki, M. Hanabata, Y. Maekawa, R. Sooriyakumaran, E. A. Mash, Eiichi Kobayashi, Mikio Yamachika, Yasutaka Kobayashi, Yoshiji Yumoto, Takao Miura, W. D. Hinsberg, S. A. MacDonald, C.-P. Lei, S. K. Obendorf, Kwang-Duk Ahn, Deok-Il Koo, G. M. Wallraff, Masamitsu Shirai, Masahiro Tsunooka, E. Yano, T. Namiki, Y. Yoneda, W. J. Dressick, C. S. Dulcey, M. S. Chen, J. H. Georger, D. A. Stenger, T. S. Koloski, G. S. Calabrese, Michael T. Pottiger, John C. Coburn, M. F. Welker, G. L. Grune, R. T. Chern, Shinji Ando, Shigekuni Sasaki, K. Ushida, H. Sh

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Presents recent advances in chemically amplified resists for deep UV, electron beam, and X-ray advanced lithographic technologies. Discusses top surface imaging and dry development resists. Examin...

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Polymers For Microelectronics : Resists And Dielectrics : Developed From A Symposium Sponsored By The Division Of Polymeric Materials: Science And Engineering, Inc., Of The American Chemical Society And The Society Of Polymer Science, Japan, At The 203rd National Meeting Of The American Chemical Society, San Francisco, California, April 5-10, 1992
Polymers For Microelectronics : Resists And Dielectrics : Developed From A Symposium Sponsored By The Division Of Polymeric Materials: Science And Engineering, Inc., Of The American Chemical Society And The Society Of Polymer Science, Japan, At The 203rd National Meeting Of The American Chemical Society, San Francisco, California, April 5-10, 1992

By C. W. Frank, F. Rodriguez, Ê Chin, A. Kira, David R. Bassett, Ying Jiang, R. F. W. Pease, Nobuo Matsumura, J. M. Calvert, Ralph Dammel, L. F Thompson, James R. Sheats, C. D Snyder, Y. Ueda, S. Tagawa, K Watanabe, Y. Yoshida, Makoto Murata, Seiichi Tagawa, H. Ito, C. Grant Willson, T. Kusumoto, R. D. Allen, V. Rao, Tohru Matsuura, Kiichi Takemoto, H. R. Allcock, Larry F. Thompson, L. L. Simpson, T. Long, Yoshiaki Inaki, V. T. Stannett, J. M. Kometani, R. R. Kunz, E. Reichmanis, F. M. Houlihan, O. Nalamasu, T. X. Neenan, N. Takeyama, H. Ueki, M. Hanabata, Y. Maekawa, R. Sooriyakumaran, E. A. Mash, Eiichi Kobayashi, Mikio Yamachika, Yasutaka Kobayashi, Yoshiji Yumoto, Takao Miura, W. D. Hinsberg, S. A. MacDonald, C.-P. Lei, S. K. Obendorf, Kwang-Duk Ahn, Deok-Il Koo, G. M. Wallraff, Masamitsu Shirai, Masahiro Tsunooka, E. Yano, T. Namiki, Y. Yoneda, W. J. Dressick, C. S. Dulcey, M. S. Chen, J. H. Georger, D. A. Stenger, T. S. Koloski, G. S. Calabrese, Michael T. Pottiger, John C. Coburn, M. F. Welker, G. L. Grune, R. T. Chern, Shinji Ando, Shigekuni Sasaki, K. Ushida, H. Sh

Average: 0.00, 0 Ratings

Presents recent advances in chemically amplified resists for deep UV, electron beam, and X-ray advanced lithographic technologies. Discusses top surface imaging and dry development resists. Examin...

Read More

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