C.-P. Lei Books

Polymers For Microelectronics: Resists And Dielectrics
Polymers For Microelectronics: Resists And Dielectrics

By Thompson, C. W. Frank, F. Rodriguez, Ê Chin, A. Kira, David R. Bassett, Ying Jiang, R. F. W. Pease, Nobuo Matsumura, J. M. Calvert, Ralph Dammel, L. F Thompson, James R. Sheats, C. D Snyder, Y. Ueda, S. Tagawa, K Watanabe, Y. Yoshida, Makoto Murata, Seiichi Tagawa, H. Ito, C. Grant Willson, T. Kusumoto, R. D. Allen, V. Rao, Tohru Matsuura, Kiichi Takemoto, H. R. Allcock, Larry F. Thompson, L. L. Simpson, T. Long, Yoshiaki Inaki, V. T. Stannett, J. M. Kometani, R. R. Kunz, Larry F. Et Al (Eds), E. Reichmanis, F. M. Houlihan, O. Nalamasu, T. X. Neenan, N. Takeyama, H. Ueki, M. Hanabata, Y. Maekawa, R. Sooriyakumaran, E. A. Mash, Eiichi Kobayashi, Mikio Yamachika, Yasutaka Kobayashi, Yoshiji Yumoto, Takao Miura, W. D. Hinsberg, S. A. MacDonald, C.-P. Lei, S. K. Obendorf, Kwang-Duk Ahn, Deok-Il Koo, G. M. Wallraff, Masamitsu Shirai, Masahiro Tsunooka, E. Yano, T. Namiki, Y. Yoneda, W. J. Dressick, C. S. Dulcey, M. S. Chen, J. H. Georger, D. A. Stenger, T. S. Koloski, G. S. Calabrese, Michael T. Pottiger, John C. Coburn, M. F. Welker, G. L. Grune, R. T. Chern, Shinji Ando, Shigekuni Sasaki, K. Ushida, H. Sh

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Presents recent advances in chemically amplified resists for deep UV, electron beam, and X-ray advanced lithographic technologies. Discusses top surface imaging and dry development resists. Examin...

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